Cleaner Chemistries
General Chemical offers the broadest line of microelectronic Cleaner chemistries. The GenSolve™ family strips negative / positive photoresist, and PMD™ Series cleans sidewall residue for Cu/Low-K Devices. These products provide processing choices and advantages over current industry standards for both Copper and Aluminum devices. The General Chemical Technology Group has an understanding of current technical challenges and is committed to developing the advanced chemistries required to meet the needs of the semiconductor and packaging industries.
Products Application
- Post Etch Residue Remover for Cu/Low-k Devices
- Positive Photoresist and Residue Remover
- Negative Photoresist and Residue Remover
- Sidewall Polymer & Residue Remover
- Thick Photoresist Stripper
- Temporary Mounting & Demounting wafer
GenSolve™ & PMD™ Products
| Product |
GenSolve™ 300 Series |
GenSolve™ 400 Series |
GenSolve™ 500 Series |
GenSolve™ 600 Series |
GenSolve™ 700 Series |
PMD™ Series |
| Pos. Novolak Resist |
• |
• | • | x | ||
| Pos. Novolak Baked |
• |
• | • |
x |
||
| Neg. Acrylic/Film | • | |||||
| Neg. Isoprene | • | • | x | |||
| Hydrocarbon Waxes |
• |
|||||
• |
• |
• Indicates a link to the product bulletin
x Indicates specification is not available online at this time, please contact customer service
